The state of art tool includes unique patented technologies to achieve unprecedented etching control and uniformity across up to 200 mm diameter wafers area. It has been partly financed by SNF R’Equip project Nr 206021_189662 “Advanced Si DRIE tool for highly uniform ultra-deep structuring (SiDRY)” and will be installed in the clean room of Laboratory for Micro and Nanotechnology. The grating fabrication team is excited to explore the capabilities of new system towards achieving our ambitious goals in pushing the application for X-ray grating based interferometry towards even higher energies and with even smaller pitch on large areas. (Photo: Konstantins Jefimovs (left) and Zhitian Shi (right) supervise the unpacking of the new SPTS Rapier system.)