SIS - X09LA: Surface / Interface Spectroscopy

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The Surface/Interface Spectroscopy (SIS) beamline provides a state-of-the-art experimental set-up to study the electronic band structure of novel complex materials by spin- and angle-resolved photoemission spectroscopies. The beamline operates in the energy range from 20 to 800 eV with high flux, high resolution, variable polarization, and low high-harmonic contamination.

The beamline serves two endstations:

  • ULTRA (Ultra Low-Temperature high-Resolution ARPES)
    for angle-resolved photoelectron spectroscopy (ARPES)
  • COPHEE (Complete PHotoEmission Experiment)
    for spin- and angle-resolved photoelectron spectroscopy (SARPES)

Users can apply for beamtime with the provided endstations or with their own endstation (after prior consultation with the beamline scientist).

Energy range20 - 800 eV
Resolving power (E/Δ E)104
Polarizationlinear horizontal (20 - 800 eV)
linear vertical (40 - 800 eV)
circular left/right (50-800 eV)
Flux on sample (200 eV)2*1013 ph/s/0.1%BW/0.4 A
Higher order mode contamination< 0.1 %
Spot size on sample (200 eV)50 x 100 µm2 (FWHM)