Archive (former LMN)

  • Ahsan A, Buimaga-Iarinca L, Nijs T, Nowakowska S, Sk R, Mousavi SF, et al.
    Induced fit and mobility of cycloalkanes within nanometer-sized confinements at 5 K
    Journal of Physical Chemistry Letters. 2022; 13(32): 7504-7513. https://doi.org/10.1021/acs.jpclett.2c01592
    DORA PSI
  • Allenet T, Vockenhuber M, Yeh C-K, Santaclara JG, van Lent-Protasova L, Ekinci Y, et al.
    EUV resist screening update: progress towards High-NA lithography
    In: Sanders DP, Guerrero D, eds. Advances in patterning materials and processes XXXIX. Vol. 12055. Proceedings of SPIE. Bellingham: SPIE; 2022:120550F (10 pp.). https://doi.org/10.1117/12.2614171
    DORA PSI
  • Armand Pilon FT, Niquet Y-M, Chretien J, Pauc N, Reboud V, Calvo V, et al.
    Investigation of lasing in highly strained germanium at the crossover to direct band gap
    Physical Review Research. 2022; 4(3): 033050 (17 pp.). https://doi.org/10.1103/PhysRevResearch.4.033050
    DORA PSI
  • Beckert A, Grimm M, Hermans RI, Freeman JR, Linfield EH, Davies AG, et al.
    Precise determination of the low-energy electronuclear Hamiltonian of LiY1-xHoxF4
    Physical Review B. 2022; 106(11): 115119 (11 pp.). https://doi.org/10.1103/PhysRevB.106.115119
    DORA PSI
  • Bergamaschi A, Andrä M, Barten R, Baruffaldi F, Brückner M, Carulla M, et al.
    First demonstration of on-chip interpolation using a single photon counting microstrip detector
    Journal of Instrumentation. 2022; 17(11): C11012 (9 pp.). https://doi.org/10.1088/1748-0221/17/11/C11012
    DORA PSI
  • Bespin C, Caicedo I, Dingfelder J, Hemperek T, Hirono T, Hügging F, et al.
    Charge collection and efficiency measurements of the TJ-Monopix2 DMAPS in 180 nm CMOS technology
    In: Carini G, Denes P, Dierickx B, Furenlid L, Horisberger R, Kagan H, et al., eds. 10th international workshop on semiconductor pixel detectors for particles and imaging. Vol. 420. Proceedings of science. Trieste: Sissa Medialab srl; 2022:080 (8 pp.). https://doi.org/10.22323/1.420.0080
    DORA PSI
  • Bespin C, Berdalovic I, Caicedo I, Cardella R, Dingfelder J, Flores L, et al.
    Development and characterization of a DMAPS chip in TowerJazz 180nm technology for high radiation environments
    Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 2022; 1040: 167189 (6 pp.). https://doi.org/10.1016/j.nima.2022.167189
    DORA PSI
  • Chiriotti S, Barten R, Bergamaschi A, Brückner M, Carulla M, Chsherbakov I, et al.
    High-spatial resolution measurements with a GaAs:Cr sensor using the charge integrating MÖNCH detector with a pixel pitch of 25 μm
    Journal of Instrumentation. 2022; 17: P04007 (17 pp.). https://doi.org/10.1088/1748-0221/17/04/P04007
    DORA PSI
  • Collé D, Erjawetz J, Ekindorf G, Heyl P, Ritter D, Reddy A, et al.
    Bend the curve – shape optimization in laser grayscale direct write lithography using a single figure of merit
    Micro and Nano Engineering. 2022; 15: 100137 (9 pp.). https://doi.org/10.1016/j.mne.2022.100137
    DORA PSI
  • Dwivedi N, Balasubramanian K, Sahu R, Manna S, Banik S, Dhand C, et al.
    Unusual high hardness and load-dependent mechanical characteristics of hydrogenated carbon-nitrogen hybrid films
    ACS Applied Materials and Interfaces. 2022; 14(17): 20220-20229. https://doi.org/10.1021/acsami.2c01508
    DORA PSI
  • Evrard Q, Sadegh N, Ekinci Y, Vockenhuber M, Mahne N, Giglia A, et al.
    Influence of counteranions on the performance of tin-based EUV photoresists
    Journal of Photopolymer Science and Technology. 2022; 35(1): 95-100. https://doi.org/10.2494/photopolymer.35.95
    DORA PSI
  • Fanciulli M, Pancaldi M, Pedersoli E, Vimal M, Bresteau D, Luttmann M, et al.
    Light and magnetic vortices: the experimental evidence of magnetic helicoidal dichroism
    In: Zouhdi S, ed. META 2022 proceedings. International conference on metamaterials, photonic crystals and plasmonics. Orsay: META Conference; 2022:373-374.
    DORA PSI
  • Fanciulli M, Pancaldi M, Pedersoli E, Vimal M, Bresteau D, Luttmann M, et al.
    Magnetic helicoidal dichroism with XUV light carrying orbital angular momentum
    In: Laasch W, Tschentscher T, eds. 14th international conference on synchrotron radiation instrumentation (SRI 2021). Vol. 2380. Journal of physics: conference series. Bristol; Philadelphia: IOP Publishing; 2022:012129 (6 pp.). https://doi.org/10.1088/1742-6596/2380/1/012129
    DORA PSI
  • Fanciulli M, Pancaldi M, Pedersoli E, Vimal M, Bresteau D, Luttmann M, et al.
    Magnetic helicoidal dichroism with XUV light carrying orbital angular momentum
    In: Proceedings the international conference on ultrafast phenomena (UP) 2022. International conference on ultrafast phenomena. Washington, DC: Optica Publishing Group; 2022:Tu2A.4 (2 pp.). https://doi.org/10.1364/UP.2022.Tu2A.4
    DORA PSI
  • Fanciulli M, Pancaldi M, Pedersoli E, Vimal M, Bresteau D, Luttmann M, et al.
    Observation of magnetic helicoidal dichroism with extreme ultraviolet light vortices
    Physical Review Letters. 2022; 128(7): 077401 (7 pp.). https://doi.org/10.1103/PhysRevLett.128.077401
    DORA PSI
  • Finizio S, Bailey JB, Olsthoorn B, Raabe J
    Periodogram-based detection of unknown frequencies in time-resolved scanning transmission X-ray microscopy
    ACS Nano. 2022; 16(12): 21071-21078. https://doi.org/10.1021/acsnano.2c08874
    DORA PSI
  • Flenner S, Hagemann J, Storm M, Kubec A, Qi P, David C, et al.
    Hard X-ray nanotomography at the P05 imaging beamline at PETRA III
    In: Müller B, Wang G, eds. Developments in X-Ray tomography XIV. Vol. 12242. Proceedings of SPIE. Bellingham: SPIE; 2022:122420L (8 pp.). https://doi.org/10.1117/12.2632706
    DORA PSI
  • Frolov AS, Usachov DY, Fedorov AV, Vilkov OY, Golyashov V, Tereshchenko OE, et al.
    Ferromagnetic layers in a topological insulator (Bi,Sb)2Te3 crystal doped with Mn
    ACS Nano. 2022; 16(12): 20831-20841. https://doi.org/10.1021/acsnano.2c08217
    DORA PSI
  • Fröjdh E, Baruffaldi F, Bergamaschi A, Carulla M, Dinapoli R, Greiffenberg D, et al.
    Detection of MeV electrons using a charge integrating hybrid pixel detector
    Journal of Instrumentation. 2022; 17(12): C12004 (8 pp.). https://doi.org/10.1088/1748-0221/17/12/C12004
    DORA PSI
  • Fröjdh E, Abrahams JP, Andrä M, Barten R, Bergamaschi A, Brückner M, et al.
    Electron detection with CdTe and GaAs sensors using the charge integrating hybrid pixel detector JUNGFRAU
    Journal of Instrumentation. 2022; 17: C01020 (12 pp.). https://doi.org/10.1088/1748-0221/17/01/C01020
    DORA PSI
  • Glazyrin K, Khandarkhaeva S, Fedotenko T, Dong W, Laniel D, Seiboth F, et al.
    Sub-micrometer focusing setup for high-pressure crystallography at the Extreme Conditions beamline at PETRA III
    Journal of Synchrotron Radiation. 2022; 29: 654-663. https://doi.org/10.1107/S1600577522002582
    DORA PSI
  • Grimes M, Gurung N, Ueda H, Porter DG, Pedrini B, Heyderman LJ, et al.
    X-ray investigation of long-range antiferromagnetic ordering in FeRh
    AIP Advances. 2022; 12(3): 035048 (5 pp.). https://doi.org/10.1063/9.0000320
    DORA PSI
  • Heymes J, Ivory J, Stefanov K, Buggey T, Hetherington O, Soman M, et al.
    Characterisation of a soft X-ray optimised CMOS Image Sensor
    Journal of Instrumentation. 2022; 17(5): P05003 (16 pp.). https://doi.org/10.1088/1748-0221/17/05/P05003
    DORA PSI
  • Hinger V, al Haddad A, Barten R, Bergamaschi A, Brückner M, Carulla M, et al.
    Advancing the JUNGFRAU detector toward low-energy X-ray applications
    Journal of Instrumentation. 2022; 17(9): C09027 (7 pp.). https://doi.org/10.1088/1748-0221/17/09/C09027
    DORA PSI
  • Kang BJ, Rohrbach D, Brunner FDJ, Bagiante S, Sigg H, Feurer T
    Ultrafast and low-threshold THz mode switching of two-dimensional nonlinear metamaterials
    Nano Letters. 2022; 22(5): 2016-2022. https://doi.org/10.1021/acs.nanolett.1c04776
    DORA PSI
  • Kim HS, Nebling R, Dejkameh A, Shen T, Ekinci Y, Mochi I
    Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology
    Journal of Micro/Nanopatterning, Materials, and Metrology. 2022; 21(3): 34002 (12 PP.). https://doi.org/10.1117/1.JMM.21.3.034002
    DORA PSI
  • Korzyński MD, Bernhardt M, Romankov V, Dreiser J, Matmon G, Pointillart F, et al.
    Cyclooctatetraenide-based single-ion magnets featuring bulky cyclopentadienyl ligand
    Chemical Science. 2022; 13(35): 10574-10580. https://doi.org/10.1039/D2SC02560D
    DORA PSI
  • Koutsouflakis E, Krylov D, Bachellier N, Sostina D, Dubrovin V, Liu F, et al.
    Metamagnetic transition and a loss of magnetic hysteresis caused by electron trapping in monolayers of single-molecule magnet Tb2@C79N
    Nanoscale. 2022; 14(27): 9877-9892. https://doi.org/10.1039/d1nr08475e
    DORA PSI
  • Kubec A, Zdora M-C, Sanli UT, Diaz A, Vila-Comamala J, David C
    An achromatic X-ray lens
    Nature Communications. 2022; 13: 1305 (7 pp.). https://doi.org/10.1038/s41467-022-28902-8
    DORA PSI
  • Kubec A, Samadi N, Langer M, Döring F, Rösner B, Guzenko VA, et al.
    Slope error correction on X-ray reflection gratings by a variation of the local line density
    Optics Express. 2022; 30(26): 46248-46258. https://doi.org/10.1364/OE.471438
    DORA PSI
  • Kubec A, Döring F
    XRnanotech - recent developments in nanostructured X-ray and EUV optics
    In: Compact EUV & X-ray light sources 2022. Vol. EF3A. High-brightness sources and light-driven interactions. Washington, DC: Optica Publishing Group; 2022:EF3A.3. https://doi.org/10.1364/EUVXRAY.2022.EF3A.3
    DORA PSI
  • Kurzhals P, Kremer G, Jaouen T, Nicholson CW, Heid R, Nagel P, et al.
    Electron-momentum dependence of electron-phonon coupling underlies dramatic phonon renormalization in YNi2B2C
    Nature Communications. 2022; 13(1): 228 (9 pp.). https://doi.org/10.1038/s41467-021-27843-y
    DORA PSI
  • Küchle JT, Baklanov A, Seitsonen AP, Ryan PTP, Feulner P, Pendem P, et al.
    Silicene's pervasive surface alloy on Ag(111): a scaffold for two-dimensional growth
    2D Materials. 2022; 9(4): 045021 (13 pp.). https://doi.org/10.1088/2053-1583/ac8a01
    DORA PSI
  • Lee WC, Sagehashi R, Zhang Y, Popov AA, Muntwiler M, Greber T
    X-ray absorption measurements at a bending magnet beamline with an Everhart–Thornley detector: a monolayer of Ho3N@C80 on graphene
    Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 2022; 40(5): 053205 (3 pp.). https://doi.org/10.1116/6.0001961
    DORA PSI
  • Lewis SM, Alty HR, Vockenhuber M, DeRose GA, Fernandez-Mato A, Kazazis D, et al.
    Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography
    Journal of Micro/Nanopatterning, Materials, and Metrology. 2022; 21(4): 041404 (9 pp.). https://doi.org/10.1117/1.JMM.21.4.041404
    DORA PSI
  • Lyubomirskiy M, Wittwer F, Kahnt M, Koch F, Kubec A, Falch KV, et al.
    Multi-beam X-ray ptychography using coded probes for rapid non-destructive high resolution imaging of extended samples
    Scientific Reports. 2022; 12(1): 6203 (9 pp.). https://doi.org/10.1038/s41598-022-09466-5
    DORA PSI
  • Ma J-Z, Zhang S-N, Song JP, Wu Q-S, Ekahana SA, Naamneh M, et al.
    Giant Chern number of a Weyl nodal surface without upper limit
    Physical Review B. 2022; 105(11): 115118 (8 pp.). https://doi.org/10.1103/PhysRevB.105.115118
    DORA PSI
  • Meyer M, Andrä M, Barten R, Bergamaschi A, Brückner M, Busca P, et al.
    Observation of radiation damage in CdTe Schottky sensors created by 20 keV photons
    Journal of Instrumentation. 2022; 17(6): P06035 (22 pp.). https://doi.org/10.1088/1748-0221/17/06/P06035
    DORA PSI
  • Mokhtarzadeh M, Carulla M, Kozak R, David C
    Optimization of etching processes for the fabrication of smooth silicon carbide membranes for applications in quantum technology
    Micro and Nano Engineering. 2022; 16: 100155 (7 pp.). https://doi.org/10.1016/j.mne.2022.100155
    DORA PSI
  • Mortelmans T, Kazazis D, Werder J, Kristiansen PM, Ekinci Y
    Injection molding of thermoplastics for low-cost nanofluidic devices
    ACS Applied Nano Materials. 2022; 5(12): 17758-17766. https://doi.org/10.1021/acsanm.2c03731
    DORA PSI
  • Mortelmans T, Kazazis D, Padeste C, Berger P, Li X, Ekinci Y
    Poly(methyl methacrylate)-based nanofluidic device for rapid and multiplexed serological antibody detection of SARS-CoV-2
    ACS Applied Nano Materials. 2022; 5(1): 517-526. https://doi.org/10.1021/acsanm.1c03309
    DORA PSI
  • Moustakas K, Noulis T, Siskos S
    Compact ground bounce sensors for SoC energy harvesting applications
    In: 2022 11th international conference on modern circuits and systems technologies (MOCAST 2022). International conference on modern circuits and systems technologies (MOCAST). Piscataway, NJ: IEEE; 2022:21928980 (4 pp.). https://doi.org/10.1109/MOCAST54814.2022.9837552
    DORA PSI
  • Moustakas K, Noulis T
    Wide band differential on-chip monitoring of system on chip power supplies noise
    AEU - International Journal of Electronics and Communications. 2022; 154: 154311 (10 pp.). https://doi.org/10.1016/j.aeue.2022.154311
    DORA PSI
  • Mraz A, Venturini R, Svetin D, Sever V, Mihailovic IA, Vaskivskyi I, et al.
    Charge configuration memory devices: energy efficiency and switching speed
    Nano Letters. 2022; 22(12): 4814-4821. https://doi.org/10.1021/acs.nanolett.2c01116
    DORA PSI
  • Nasr Esfahani M, Zare Pakzad S, Li T, Li XF, Tasdemir Z, Wollschläger N, et al.
    Effect of native oxide on stress in silicon nanowires: implications for nanoelectromechanical systems
    ACS Applied Nano Materials. 2022; 5(9): 13276-13285. https://doi.org/10.1021/acsanm.2c02983
    DORA PSI
  • Ozkan Loch C, Bonnin A, Vila-Comamala J, Samadi N, Stampfli AMM, Ischebeck R
    SLS 2.0 - status of the diagnostics
    In: IBIC2022 proceedings. Proceedings of the International Beam Instrumentation Conference, IBIC. JACoW Publishing; 2022:15-18. https://doi.org/10.18429/JACoW-IBIC2022-MOP01
    DORA PSI
  • Penco G, Perosa G, Allaria E, Badano L, Bencivenga F, Brynes A, et al.
    Nonlinear harmonics of a seeded free-electron laser as a coherent and ultrafast probe to investigate matter at the water window and beyond
    Physical Review A. 2022; 105(5): 053524 (14 pp.). https://doi.org/10.1103/PhysRevA.105.053524
    DORA PSI
  • Qi P, Shvyd'ko Y
    Signatures of misalignment in x-ray cavities of cavity-based x-ray free-electron lasers
    Physical Review Accelerators and Beams. 2022; 25(5): 050701 (20 pp.). https://doi.org/10.1103/PhysRevAccelBeams.25.050701
    DORA PSI
  • Reiche S, Knopp G, Pedrini B, Prat E, Aeppli G, Gerber S
    A perfect X-ray beam splitter and its applications to time-domain interferometry and quantum optics exploiting free-electron lasers
    Proceedings of the National Academy of Sciences of the United States of America PNAS. 2022; 119(7): e2117906119 (5 pp.). https://doi.org/10.1073/pnas.2117906119
    DORA PSI
  • Rouxel JR, Rösner B, Karpov D, Bacellar C, Mancini GF, Zinna F, et al.
    Hard X-ray helical dichroism of disordered molecular media
    Nature Photonics. 2022; 16(8): 570-574. https://doi.org/10.1038/s41566-022-01022-x
    DORA PSI
  • Saifullah MSM, Asbahi M, Neo DCJ, Mahfoud Z, Tan HR, Ha ST, et al.
    Patterning at the resolution limit of commercial electron beam lithography
    Nano Letters. 2022; 22(18): 7432-7440. https://doi.org/10.1021/acs.nanolett.2c02339
    DORA PSI
  • Saifullah MSM, Tiwale N, Ganesan R
    Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning
    Journal of Micro/Nanopatterning, Materials, and Metrology. 2022; 21(4): 041402 (35 pp.). https://doi.org/10.1117/1.JMM.21.4.041402
    DORA PSI
  • Samadi N, Shi X, Ozkan Loch C, Krempasky J, Boege M, Chapman D, et al.
    A spatial beam property analyzer based on dispersive crystal diffraction for low-emittance X-ray light sources
    Scientific Reports. 2022; 12(1): 18267 (9 pp.). https://doi.org/10.1038/s41598-022-23004-3
    DORA PSI
  • Samadi N, Ozkan Loch C, Lovric G, Shi X
    An X-ray beam property analyzer besed on dispersive crystal diffraction
    In: IBIC2022 proceedings. Proceedings of the International Beam Instrumentation Conference, IBIC. JACoW Publishing; 2022:366-369. https://doi.org/10.18429/JACoW-IBIC2022-WE1C2
    DORA PSI
  • Scheel M, Perrin J, Koch F, Daniel G, Giorgetta JL, Cauchon G, et al.
    Current status of hard X-ray nano-tomography on the transmission microscope at the ANATOMIX beamline
    In: Laasch W, Tschentscher T, eds. 14th international conference on synchrotron radiation instrumentation (SRI 2021). Vol. 2380. Journal of physics: conference series. Bristol; Philadelphia: IOP Publishing; 2022:012045(5 pp.). https://doi.org/10.1088/1742-6596/2380/1/012045
    DORA PSI
  • Schroer CG, Seiboth F, Schropp A, Achilles S, Seyrich M, Patjens S, et al.
    Hard X-ray wavefront engineering for aberration correction and beam shaping
    In: Khounsary AM, Mimura H, Morawe C, eds. Advances in X-ray/EUV optics and components XVII. Vol. 12240. Proceedings of SPIE. Bellingham: SPIE; 2022:122400J (8 pp.). https://doi.org/10.1117/12.2633458
    DORA PSI
  • Schunck JO, Döring F, Rösner B, Buck J, Engel RY, Miedema PS, et al.
    Microstructure effects on the phase transition behavior of a prototypical quantum material
    Scientific Reports. 2022; 12(1): 10464 (7 pp.). https://doi.org/10.1038/s41598-022-13872-0
    DORA PSI
  • Seiboth F, Kubec A, Schropp A, Niese S, Gawlitza P, Garrevoet J, et al.
    Rapid aberration correction for diffractive X-ray optics by additive manufacturing
    Optics Express. 2022; 30(18): 31519-31529. https://doi.org/10.1364/OE.454863
    DORA PSI
  • Shen T, Kazazis D, Kim H-S, Dejkameh A, Nebling R, Ekinci Y, et al.
    EUV mask defect material characterization through actinic lensless imaging
    In: Robinson JC, Sendelbach MJ, eds. Metrology, inspection, and process control XXXVI. Vol. 12053. Proceedings of SPIE. Bellingham: SPIE; 2022:120530H (8 pp.). https://doi.org/10.1117/12.2613337
    DORA PSI
  • Shen T, Ekinci Y, Mochi I
    Reflective grazing incidence EUV nanoscope for wafer metrology
    In: Itani T, Naulleau PP, Gargini PA, Ronse KG, eds. International conference on extreme ultraviolet lithography 2022. Vol. 12292. Proceedings of SPIE. Bellingham, USA: SPIE; 2022:122920O (7 pp.). https://doi.org/10.1117/12.2641776
    DORA PSI
  • Steppke A, Hamann S, König M, Mackenzie AP, Kliemt K, Krellner C, et al.
    Microstructuring YbRh2Si2 for resistance and noise measurements down to ultra-low temperatures
    New Journal of Physics. 2022; 24(12): 123033 (15 pp.). https://doi.org/10.1088/1367-2630/aca8c6
    DORA PSI
  • Storm M, Döring F, Marathe S, Cipiccia S, David C, Rau C
    Optimizing the energy bandwidth for transmission full-field X-ray microscopy experiments
    Journal of Synchrotron Radiation. 2022; 29: 138-147. https://doi.org/10.1107/S1600577521011206
    DORA PSI
  • Tarasov AV, Glazkova D, Schulz S, Poelchen G, Kliemt K, Kraiker A, et al.
    Crystal electric field and properties of 4f magnetic moments at the surface of the rare-earth compound TbRh2Si2
    Physical Review B. 2022; 106(15): 155136 (12 pp.). https://doi.org/10.1103/PhysRevB.106.155136
    DORA PSI
  • Tarasov AV, Mende M, Ali K, Poelchen G, Schulz S, Vilkov OY, et al.
    Structural instability at the In-terminated surface of the heavy-fermion superconductor CeIrIn5
    Surfaces and Interfaces. 2022; 32: 102126 (6 pp.). https://doi.org/10.1016/j.surfin.2022.102126
    DORA PSI
  • Thakur N, Vockenhuber M, Ekinci Y, Watts B, Giglia A, Mahne N, et al.
    Fluorine-rich zinc oxoclusters as extreme ultraviolet photoresists: chemical reactions and lithography performance
    ACS Materials Au. 2022; 2(3): 343-355. https://doi.org/10.1021/acsmaterialsau.1c00059
    DORA PSI
  • Wang Y, Chen J, Zeng Y, Yu T, Guo X, Wang S, et al.
    Molecular glass resists based on tetraphenylsilane derivatives: effect of protecting ratios on advanced lithography
    ACS Omega. 2022; 7(33): 29266-29273. https://doi.org/10.1021/acsomega.2c03445
    DORA PSI
  • Wang Z, Chen J, Yu T, Zeng Y, Yang G, Allenet T, et al.
    Water developable non-chemically amplified photoresist for electron beam and extreme ultraviolet lithography
    Journal of Micro/Nanopatterning, Materials, and Metrology. 2022; 21(4): 041403 (10 pp.). https://doi.org/10.1117/1.JMM.21.4.041403
    DORA PSI
  • Weiss C, Wilson J, Tiebel G, Steinegger P, Griesmayer E, Frais-Kölbl H, et al.
    High-temperature performance of solid-state sensors up to 500 °C
    Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 2022; 1040: 167182 (4 pp.). https://doi.org/10.1016/j.nima.2022.167182
    DORA PSI
  • Woerle J, Johnson BC, Stark R, Camarda M, Grossner U
    Fast defect mapping at the SiO2/SiC interface using confocal photoluminescence
    In: Michaud JF, Phung LV, Alquier D, Planson D, eds. Silicon carbide and related materials 2021. Vol. 1062. Materials science forum. Bäch: Trans Tech Publications; 2022:389-394. https://doi.org/10.4028/p-78l92c
    DORA PSI
  • Wätzel J, Rebernik Ribič P, Coreno M, Danailov MB, David C, Demidovich A, et al.
    Light-induced magnetization at the nanoscale
    Physical Review Letters. 2022; 128(15): 157205 (6 pp.). https://doi.org/10.1103/PhysRevLett.128.157205
    DORA PSI
  • Zhang J, Barten R, Baruffaldi F, Bergamaschi A, Borghi G, Boscardin M, et al.
    Development of LGAD sensors with a thin entrance window for soft X-ray detection
    Journal of Instrumentation. 2022; 17(11): C11011 (10 pp.). https://doi.org/10.1088/1748-0221/17/11/C11011
    DORA PSI
  • Aderneuer T, Fernandez O, Karpik A, Werder J, Marhöfer M, Kristiansen PM, et al.
    Surface topology and functionality of freeform microlens arrays
    Optics Express. 2021; 29(4): 5033-5042. https://doi.org/10.1364/OE.415453
    DORA PSI
  • Alarab F, Hricovini K, Leikert B, Nicolaï L, Fanciulli M, Heckmann O, et al.
    Photoemission study of pristine and Ni-doped SrTiO3 thin films
    Physical Review B. 2021; 104(16): 165129 (8 pp.). https://doi.org/10.1103/PhysRevB.104.165129
    DORA PSI
  • Allenet T, Mortelmans T, Vockenhuber M, Yeh C-K, Ekinci Y
    From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography
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