Beamline Layout



Element Distance from source [ m ]
Slit 0 (horizontal direction only) 12.1
Slit 1 26.0
Si(111) Monochromator, 2nd crystal variable horizontal focusing 28.6 (2nd crystal)
Mirror with SiO2, Rh, and Pt coating, variable vertically focusing 29.4
Slit 2 30.7
Slit 3 ~33.4
Fast shutter ~33.6
Slit 4 ~33.7
Sample position ~34
Detector position up to ~41