The Thin Films and Interfaces Group focuses on the preparation of highly defined thin films, mainly oxides, by pulsed laser deposition (PLD) for applications in energy technology. We also study other materials properties, such as multiferroicity. We are working on the fundamental understanding of the PLD process, the influence of strain on material properties and we utilize the large facilities at PSI (neutrons, muons, and photons from the SLS). More details can be found on our group web pages.