327-2210-00L Thin Films Technology - From Fundamentals to Oxide Electronics

SemesterFall Semester 2024
LecturersC. W. Schneider and M. Trassin
Periodicityyearly course
ECTS Points5 ECTS Points can be obtained
Time

Tue 15:45-17:30; 

Thu 09:45-11:30 

Location

Tue: HCI D8; 

Thu: HCI D2

Lecture Notesare available
Date 2024TopicLecturer
Sept. 17General IntroductionTrassin/Schneider
Sept. 19Fundamentals IC. W. Schneider
Sept. 24Fundamentals II (Nucleation)C. W. Schneider
Sept. 26Fundamentals III (Epitaxy)C. W. Schneider
Oct. 01Growth mode & PVD - sputtering M. Trassin
Oct. 03RF sputtering; evap/MBEM. Trassin
Oct. 08PVD - PLD Schneider/Yan
Oct. 10CVDC. W. Schneider
Oct. 15Lab visitTrassin/Yan
Oct. 17Lab visitTrassin/Yan
Oct. 22Lab visitTrassin/Yan
Oct. 24Non-Vacuum techniqueSchneider/Yan
Oct. 29Non-Vac. technique (Sol Gel) / Struct. charact XRDSchneider/Trassin
Oct. 31RHEED, AFM, Ferroic IM. Trassin
Nov. 05Ferroic IIM. Trassin
Nov. 07MF type IM. Trassin
Nov. 12TF characterization IC. W. Schneider
Nov. 14Probing FE IIM. Trassin
Nov. 19MF II and probing FE IM. Trassin
Nov. 21TF characterization IIC. W. Schneider
Nov. 26TF characterization IIIC. W. Schneider
Nov. 28TF characterization IVC. W. Schneider
Dec. 03TF characterization VC. W. Schneider
Dec. 05MicrofabricationC. W. Schneider
Dec. 10Device concepts IM. Trassin
Dec. 12Device concepts IIM. Trassin
Dec. 17Q&ATrassin/Schneider
Dec. 19written exam, Loc: HIL E6; Time: 9:45-11:30Trassin/Schneider/Yan

 

Exam:
The written exam will be in English lasting 90 min. No accessories are allowed. 

Planned are:

 

  • Possible visit to PSI with a lab tour, including the large facilities (synchrotron-SLS)-on request