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Thin films are nowadays utilized in many applications, ranging from semiconductor devices to optical coatings and are even present in pharmaceuticals (polymers). This wide-spread application of films with thicknesses from atomic monolayers to microns is due to the developments of thin film deposition techniques. Thin films are also important for studies of materials with new and unique properties due to the possibility of tuning their crystallographic and morphological properties. The thin film approach, i.e. the presence of interfaces (to a substrate or the film surface) adds more degrees of freedom for influencing the properties of materials, e.g. by lattice strain or surface functionalization. For these fundamental studies of material properties large research facilities such as synchrotron radiation or neutron spallation sources are one of the keys that the Paul Scherrer Institute (PSI) provides.
News
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LMX SEMINAR
Date: Thursday 25 July, 2024, 13:00
Speaker: Sourav Sahoo
Room: OSGA/EG06
TFI SEMINAR
Date: Wednesday 28 August, 2024, 16:00
Title: TBA
Speaker: Fatima Haydous
Room: OFLG/402
September 2024
iWOE-30 2024
International Workshop on Oxide Electronics
September 29.-2.October 2024 , Darmstadt, Germany
More Information
Scientific Highlights
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Projects @ TFI
Most of the time we have student projects related to the work we do. Just talk to us if you are interested in something we are working on not advertised on our pages.
Currently, we are looking for a Semester or Master Student on the topic of ferroelectric field effect transistors (FeFETs).
If anyone is interested, please contact Prof. Dr. Thomas Lippert (thomas.lippert@psi.ch) or Dr Nikita Shepelin (nikita.shepelin@psi.ch).
At present, we have no open PhD positions available. Other open positions are always published on the PSI Open Positions page.