Research Projects

3D topographies are highly attractive for various applications in optics, fluidics, or biosciences, where a complex surface profile adds an improved functionality to elements or devices. However, current lithographies are often limited in pattern variety. Therefore structures are often fabricated using the combinations of different processes in a sequential way.

Nanoimprint Lithography (NIL) is a novel technique for the fabrication of nanostructures on large surfaces. The method is based on the excellent replication fidelity obtained with polymers. Once a solid stamp with a nanorelief on the surface is fabricated it can be used for the replication of many identical surface patterns. It therefore circumvents many limitations of conventional photolithography. In PSI we use both thermal NIL into various thermoplastic materials and UV-assisted NIL, e.g.