Dr. Konstantins Jefimovs received his PhD degree in Physics from University of Joensuu (Finland) in 2003. His main research field there was plasmonics and development of technologies for the fabrication of diffractive optical elements for scientific and commercial applications. In 2005 he moved to Paul Scherrer Institut, where he worked as a postdoc researcher on fabrication of focusing optics for x-ray microscopy applications. One of his achievements was the fabrication of Fresnel zone plates with record resolution achieved in scanning x-ray microscopy at that time. From 2007 to 2013 he was researcher at EMPA, where his main research was focused on fabrication technologies based on laser ablation and focused ion beam milling techniques for x-ray optics, photonics, plasmonics and metamaterials, as well as the development of novel technologies for wide range of applications related to optics. In 2013 he re-joined PSI as a member of TOMCAT group, where his main focus was the development of novel methods for the fabrication of small pitch, large area gratings for phase contrast x-ray and neutron imaging applications. In 2021 he moved to Nanotechnology group as a Process Engineer. His current research interest process are development of plasma etching processes and displacement Talbot lithography for photonic (with emphasis on plasmonics), quantum and x-ray applications.

Full publication list is available on ResearcherID:

P. Pellacani, K. Jefimovs, M. Angelini, F. Marabelli, V. Tolardo, D. Kazazis, F. Floris, "Nanofabrication Process Scale-Up via Displacement Talbot Lithography of a Plasmonic Metasurface for Sensing Applications," Optics 5 (2024) 165-175. DOI: 10.3390/opt5010012

Z. Shi, K. Jefimovs, M. Stampanoni, L. Romano, "High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch," Material Science in Semiconductor Processing 157 (2023) 107311. DOI: 10.1016/j.mssp.2023.107311

Z. Shi, K. Jefimovs, L. Romano, J. Vila-Comamala, M. Stampanoni, "Laboratory X-ray interferometry imaging with a fan-shaped source grating," Optics Letters  46 (2021) 3693-3696. DOI: 10.1364/OL.426867

K. Jefimovs, J. Vila-Comamala, C. Arboleda, Z. Wang, L. Romano, Z. Shi, M. Kagias, M. Stampanoni, "Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating," Micromachines 12 (2021) 517. DOI: 10.3390/mi12050517

Z. Shi, K. Jefimovs, L. Romano, M. Stampanoni, "Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching," Micromachines 11 (2020) 864. DOI: 10.3390/mi11090864

M. Kagias, Z. Wang, V. Guzenko, C. David, M. Stampanoni, K. Jefimovs, “Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry,” Mat. Sci. Semicon. Proc. 92 (2019) 73-79. DOI: 10.1016/j.mssp.2018.04.015 DORA

J. Vila-Comamala, L. Romano, V. Guzenko, M. Kagias, M. Stampanoni, K. Jefimovs, “Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium,” Microelectron. Eng. 192 (2018) 19-24. DOI: 10.1016/j.mee.2018.01.027 DORA

L. Romano, J. Vila-Comamala, H. Schift, M. Stampanoni, K. Jefimovs, “Hot embossing of Au- and Pb-based alloys for x-ray grating fabrication,” J. Vac. Sci. Technol. 35 (6) (2017) 06G302. DOI: 10.1116/1.4991807 DORA

L. Romano, J. Vila-Comamala, M. Kagias, K. Vogelsang, H. Schift, M. Stampanoni, K. Jefimovs,” High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication,” Microelectron. Eng. 176 (2017) 6-10. DOI: 10.1016/j.mee.2016.12.032 DORA

K. Jefimovs, L. Romano, J. Vila-Comamala, M. Kagias, Z. Wang, L. Wang, C. Dais, H. Solak, M. Stampanoni, “High aspect ratio silicon structures by Displacement Talbot lithography and Bosch etching,” Proc. of SPIE 10146 (2017) 101460L. DOI: 10.1117/12.2258007 DORA