Heidelberg DWL66+ direct laser writer, funded by ANAXAM, is now in operation. It is a photolithographic system closing the gap between the mask aligners on one side and the Nanoscribe two-photon 3D lithography system on the other. It is equipped with semiconductor laser with the wave length of 405 nm and is capable of exposing the minimum feature size down to 0.3 µm on substrates up to 200 mm.
- About the Lab Contact
- Research Contact
- Facilities Contact
- Publications Contact
- News Contact
