Supported by SNF R'Equip, a new 20bit low-noise pattern generator for our 100 keV direct write electron beam lithography system Raith/Vistec EBPG5000Plus has been successfully installed. This allows for faster exposures (up to 125MHz stepping frequency) with better placement accuracy within the writing field up to 1x1 mm². The so called Universal Pattern Generator (UPG) supports now a broad spectrum of primitiv shapes, which can dramatically improve the quality of exposed nanostructures by optimized fracturing of designs.
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